TANTRAVIWAT, D., YAMWONG, W., TECHAKIJKAJORN, U., IMAI, K., & INCEESUNGVORN, B. (2018). Schottky Barrier Height Engineering of Ti/n-Type Silicon Diode by Means of Ion Implantation. Walailak Journal of Science and Technology (WJST), 15(11), 803–809. https://doi.org/10.48048/wjst.2018.5968