Spatial Temperature Profile in a Magnetised Capacitively Coupled Discharge

Shikha BINWAL; Jay K JOSHI; Shantanu Kumar KARKARI; Predhiman Krishan KAW; Lekha NAIR; Huw LEGGATE; Aoife SOMERS; Miles M TURNER

doi:10.48048/wjst.2019.4784

Authors

Shikha BINWAL Jamia Millia Islamia, Jamia Nagar, New Delhi, Delhi 110025
Jay K JOSHI Institute for Plasma Research, HBNI, Bhat Village, Gandhinagar, Gujarat 382428
Shantanu Kumar KARKARI Institute for Plasma Research, HBNI, Bhat Village, Gandhinagar, Gujarat 382428
Predhiman Krishan KAW Institute for Plasma Research, HBNI, Bhat Village, Gandhinagar, Gujarat 382428
Lekha NAIR Jamia Millia Islamia, Jamia Nagar, New Delhi, Delhi 110025
Huw LEGGATE Dublin City University, Glasnevin, Dublin 9
Aoife SOMERS Dublin City University, Glasnevin, Dublin 9
Miles M TURNER Dublin City University, Glasnevin, Dublin 9

DOI:

https://doi.org/10.48048/wjst.2019.4784

Keywords:

Emissive probe, electron temperature, transverse magnetic field, capacitive coupled discharge

Abstract

A floating emissive probe has been used to obtain the spatial electron temperature (T_e) profile in a 13.56 MHz parallel plate capacitive coupled plasma. The effect of an external transverse magnetic field and pressure on the electron temperature profile has been discussed. In the un-magnetised case, the bulk region of the plasma has a uniform T_e. Upon application of the magnetic field, the T_e profile becomes non-uniform and skewed. With increase in pressure, there is an overall reduction in electron temperature. The regions adjacent to the electrodes witnessed a higher temperature than the bulk for both cases. The emissive probe results have also been compared with particle-in-cell simulation results for the un-magnetised case.

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Author Biography

Shikha BINWAL, Jamia Millia Islamia, Jamia Nagar, New Delhi, Delhi 110025

Research Scholar

References

MA Lieberman and AJ Lichtenberg. Principles of plasma discharges and materials processing. MRS Bull. 1994; 30, 899-901.

RA Lindley, CH Bjorkman, H Shan, KH Ke, K Doan, RR Mett and M Welch. Magnetic-field optimization in a dielectric magnetically enhanced reactive ion etch reactor to produce an instantaneously uniform plasma. J. Vac. Sci. Tech. A 1998; 16, 1600-3.

MJ Buie, JTP Pender and M Dahimene, Characterization of the etch rate non-uniformity in a magnetically enhanced reactive ion etcher. J. Vac. Sci. Tech. A 1998; 16, 1464-8.

S Yang, Y Zhang, HY Wang, S Wang and W Jiang. Numerical characterization of magnetized capacitively coupled argon plasmas driven by combined dc/rf sources. Phys. Plasmas 2017; 24, 033504.

Y Fan, Y Zou, J Sun, T Stirner and D Wang. Study of the effects of a transverse magnetic field on radio frequency argon discharges by two-dimensional particle-in-cell-Monte-Carlo collision simulations. Phys. Plasmas 2013; 20, 103507.

D Gerst, S Cuynet, M Cirisan and S Mazouffre. Plasma drift in a low-pressure magnetized radio frequency discharge. Plasma Sourc. Sci. Tech. 2013; 22, 015024.

SJ You, TT Hai, M Park, DW Kim, J H Kim, D J Seong, YH Shin, SH Lee, GY Park, JK Lee and HY Chang. Role of transverse magnetic field in the capacitive discharge. Thin Solid Films 2011; 519, 6981-9.

EV Barnat, PA Miller and AM Paterson. RF discharge under the influence of a transverse magnetic field. Plasma Sourc. Sci. Tech. 2008; 17, 045005.

RF Kemp and JM Sellen. Plasma potential measurements by electron emissive probes. Rev. Sci. Instrum. 1966; 37, 455.

JP Sheehan, and N Hershkowitz. Emissive probes. Plasma Sourc. Sci. Tech. 2011; 20, 063001.

MM Turner, DA Hutchinson, RA Doyle and MB Hopkins. Heating mode transition induced by a magnetic field in a capacitive discharge. Phys. Rev. Lett. 1996; 76, 2069-72.

A Somers, HJ Leggate, S Binwal, SK Karkari and M Turner. Radio-frequency sheaths in an oblique magnetic field. In: Proceedings of 44th EPS Conference on Plasma Physics, Belfast, Northern Ireland, 2017.