Basic Principles of Growing Single-Crystalline Diamond Films

Saravut DEJMANEE

Abstract


Single-crystalline growth of diamond film is reviewed. The variations in chemical vapor deposition are discussed. In addition, the varying conditions of growth to obtain the optimum diamond films such as type of etching substrate, gas composition, temperature and pressure are compared. Finally, the characterization of the diamond films by several techniques such as Raman spectroscopy, scanning electron microscopy and X-ray diffraction are reviewed.


Keywords


Diamond film, single-crystalline, chemical vapor deposition

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References


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